Home Products Optical Components Lenses UV Fused Silica Plano-Convex (PCX) Lense
Widely used in high-precision optical systems requiring UV transparency and thermal stability: semiconductor photolithography, UV laser beam shaping, spectroscopy instruments, aerospace imaging systems, and medical diagnostic equipment. Ideal for applications needing minimal autofluorescence and superior damage resistance under intense radiation.
Fabricated from ultra-pure synthetic silica (UV-grade fused silica) with <1 ppm metallic impurities. Features a plano-convex design optimized for infinite conjugate ratios, reducing spherical aberration when curved surfaces face collimated light. AR coatings enhance transmission across deep UV to near-IR spectra.
Outperforms standard BK7 glass in UV transmission (down to 160 nm vs. 350 nm) and thermal shock resistance (coefficient of expansion ≈5.5×10⁻⁷/°C). Lower birefringence than crystalline materials like calcium fluoride. Resists solarization under prolonged UV exposure.
Enables sub-micron resolution in lithography tools; extends service life in high-power laser systems due to high laser damage thresholds; reduces stray light via anti-reflective coatings; maintains structural integrity under thermal cycling.
|
Attribute |
Value |
|
Material Type |
UV-Grade Fused Silica (Synthetic SiO₂, >99.99% Purity) |
|
Coating Options |
Broadband AR (650–1050 nm), Custom UV/IR Bandpass Coatings |
|
Wavelength Range |
160 nm – 2.2 µm (Uncoated); Enhanced Transmission with AR Coating |
|
Surface Flatness |
λ/2 Precision (Plano Side) |
|
Spherical Power Deviation |
≤3λ/2 RMS (Convex Side) |
|
Damage Threshold |
20 kW/cm² (CW @ 1070 nm); 7.5 J/cm² (Pulsed @ 810 nm, 10 Hz) |
|
Thermal Expansion Coefficient |
5.5×10⁻⁷/°C (Ultra-Low Stress Stability) |
|
Diameter Tolerance |
±0.02 mm (Small Lenses); ±0.1 mm (Large Lenses) |
|
Focal Length Tolerance |
±1% Standard; ±0.5% for Precision Applications |
|
Typical Industries |
Semiconductor Manufacturing, Laser Systems, Aerospace Optics, Medical Imaging |
Name: Ted Yu
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