Fused quartz glass plates

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  • Fused quartz glass windows

Fused quartz glass windows

  • Category: Fused quartz glass plates
  • Material Type: Fused Quartz Glass
  • Optical Performance: High Transmittance
  • Temperature Resistance: Excellent Thermal Stability
  • Chemical Resistance: Corrosion Resistant
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Applications

Used in extreme environments requiring high transmittance, chemical inertness, and thermal stability: semiconductor lithography tools, UV/VIS/IR spectrophotometers, chemical vapor deposition (CVD) chambers, high-temperature furnaces, laser systems, and analytical instruments. Acts as critical viewing ports in vacuum systems, reaction vessels, and cleanroom equipment.

Key Features

Made from ultra-pure fused silica (SiO₂) via electric melting, resulting in zero porosity and absence of bubbles/inclusions. Exhibits near-zero thermal expansion coefficient (≈5.5×10⁻⁷/°C), making it resistant to thermal shock. Maintains optical clarity across UV (down to 160nm) to near-IR spectra. Non-hygroscopic and non-leaching, ensuring no contamination of sensitive processes.

Advantages Over Alternatives

Outperforms soda-lime glass (poor UV transmission, prone to devitrification) and borosilicate glass (lower thermal shock resistance). Unlike polymer windows, it withstands high temperatures (up to 1200°C) without deformation. Compared to sapphire, it offers superior UV transmission at a fraction of the cost. Eliminates issues like yellowing, fogging, or chemical etching seen in organic glasses.

Benefits Gained

Ensures process integrity via contamination-free observation; reduces maintenance costs through extended service life (5–10x longer than standard glass); enables precise optical measurements due to consistent transmittance; enhances safety by containing hazardous processes behind a robust barrier; complies with stringent industry standards (e.g., SEMI F47 for semiconductors).


                                                                   Product Specifications Table 

Attribute Value
Material Fused Silica (99.99% SiO₂, Bubble-Free)
Thermal Shock Resistance Withstands >1000°C temperature gradient without cracking
UV Transmission Range Down to 160nm (Deep UV) with high clarity
Chemical Resistance Inert to acids/bases (excl. HF); no ionic leaching
Coefficient of Thermal Expansion Ultra-Low (5.5×10⁻⁷/°C), minimizing stress under temp changes
Optical Distortion <0.1% wavefront error @ visible wavelengths
Surface Quality Polished finish; optional anti-reflective (AR) coating
Vacuum Compatibility Heater-rated to 1×10⁻¹⁰ Torr; outgassing rate <1×10⁻¹² g/cm²/hr
Thickness Tolerance ±0.1 mm precision machining (customizable up to 50mm)
Typical Industries Semiconductor Manufacturing, Photolithography, Astronomy, Laser Systems

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